AC/Ausstattung & Services/Ausstattung Sincrotrone/DXRL


Deep X-ray lithography (DXRL) allows the production of high aspect ratio three dimensional structures in polymer with quasi perfect side-wall verticality and optical quality roughness. These structures can then be used as templates to mass-produce microparts made out of a large variety of metals, alloys or ceramics. The technique used to fabricate these parts is called LIGA.

It opens a wide variety of potential applications in the field of microelectromechanical systems (MEMs), fibre and integrated optics, microfluidic devices and interconnection technology. Moreover, the beamline performs an irradiaiton of samples with controlled X-ray doses, allowing therefore material science studies and the fabrication of microdevices made of new materials.

More details are given in the this info-folder: ELETTRA_DXRL_BROCHURE


Type Bending Magnet
Energy Range 0-20 keV
Source Size sx = 0.371 mm
sy = 0.043 mm
sy' = 14 mrad
Beam vertical divergence < 0.5 mrad
Beam horizontal divergence < 5 mrad